Sodium salt containing CIG targets, methods of making and methods of use thereof
US8338214B2 · kind B2 · utility
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51References
21Claims
0Family size
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Key dates
| Filing date | Mar 28, 2011 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Mar 28, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A sputtering target includes at least one metal selected from copper, indium and gallium and a sodium containing compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.