Micromechanical rotational speed sensor
US8342022B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2007 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Jan 12, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C19/5747
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A micromechanical rotational rate sensor includes a substrate, at least one base element suspended by at least one spring element on the substrate, an excitation device and a read-out arrangement. The base element includes at least one seismic or inertial mass. The spring element is movable perpendicularly to the motion direction of the base element so that apex or deflection points of the spring element will move perpendicularly to the excitation direction while the base element is thereby not excited to move perpendicularly to the excitation direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.