Patent · US Active

Cleaning with controlled release of acid

US8343283B2 · kind B2 · utility

3Cited by
3References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 16, 2009
Grant dateJan 1, 2013
Priority date
Expiry dateDec 2, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/40
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The present invention discloses a method for cleaning a substrate comprising contacting the substrate in a cleaning cycle with an aqueous cleaning solution comprising an aqueous diluent and a detergent composition, the detergent composition comprising a glycolic and/or lactic acid oligomer with an average degree of polymerization between 1.8 and 6. Preferably, the substrate is contacted in a rinse cycle with an aqueous rinse which is substantially free of an intentionally added rinse agent or fabric softener.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.