Cleaning with controlled release of acid
US8343283B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 16, 2009 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Dec 2, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/40
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention discloses a method for cleaning a substrate comprising contacting the substrate in a cleaning cycle with an aqueous cleaning solution comprising an aqueous diluent and a detergent composition, the detergent composition comprising a glycolic and/or lactic acid oligomer with an average degree of polymerization between 1.8 and 6. Preferably, the substrate is contacted in a rinse cycle with an aqueous rinse which is substantially free of an intentionally added rinse agent or fabric softener.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.