Organometallic compounds
US8343580B2 · kind B2 · utility
2Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2010 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Jul 14, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45525
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.