Method for fabricating liquid crystal display device
US8343787B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 25, 2011 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Nov 25, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/0241
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating an LCD device is discussed. The method in one embodiment includes: forming a gate electrode and a gate pad on a substrate, which is defined into a display area corresponding to pixel regions and a non-display area corresponding to pad regions, through a first mask process; sequentially stacking a gate insulation film, an amorphous silicon layer, an impurity-doped amorphous silicon layer and a metal film on the substrate provided with the gate electrode and then forming an active layer, source/drain electrode and a data line through a second mask process which uses one of half-tone and diffraction masks; and forming a transparent conductive material on the substrate provided with the source/drain electrode and forming a pixel electrode through a third mask process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.