Systems, methods, and apparatus for monitoring clearance in a rotary machine
US8344741B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2008 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Sep 11, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B7/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems, methods, and apparatus for monitoring clearance in a rotary machine are provided. According to one embodiment of the invention, there is disclosed a method for monitoring clearance between a rotatable member and a stationary member in a rotary machine. The method may include providing a flex circuit capacitance sensor. The flex circuit capacitance sensor may include at least one capacitance sensing layer, at least one shielding layer adjacent to the capacitance sensing layer, at least one ground layer adjacent to the shielding layer, and a set of conducting leads connected to the capacitance sensing layer. Further, the method may include mounting the capacitance sensor between a portion of the rotatable member and a portion of the stationary member. Clearance may be determined between the rotatable member and the stationary member based at least in part on a capacitance indication from the capacitance sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.