Pump stand
US8344875B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2008 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Jul 10, 2029 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04B49/06
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A vacuum pump stand (1) for generating and regulating the vacuum intended for a rotary vaporizer, including a control device having a control connection to a control unit (4) having at least one control element (3, 6). In the pump stand (1), the control unit (4) is designed as a remote control unit having a wireless control connection to the control device of the pump stand. Laboratory personnel can thus observe the rotary evaporator and the associated pump stand (1) through the divider of a fume cupboard, in order to be able to modify and readjust the process parameters at the remote control panel as needed. Because the remote control unit (4) has a wireless control connection to the control device of the pump stand (1), the fume cupboard no longer needs to be opened, even momentarily. Rather, the pump stand (1) can be operated from a sufficient distance outside the fume cupboard without the laboratory personnel needing to be exposed to special hazards.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.