Self calibration methods for optical analysis system
US8345234B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2006 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Feb 24, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/1217
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a system and methodologies for providing self-calibration in an optical analysis system. Illumination light is directed toward a material to be sampled while provisions are made to modify the characteristics of at least a portion of the illumination light falling on a reference detector. The modified characteristics may include light presence and/or spectral characteristics. Light presence may be modified by rotating or moving mirror assemblies to cause light to fall on either a sample detector or a reference detector while spectral characteristics may be modified by placing materials having known spectral characteristics in the path of the illumination light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.