Patent · US Active

Laser beam interleaving

US8345724B2 · kind B2 · utility

1Cited by
13References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 27, 2008
Grant dateJan 1, 2013
Priority date
Expiry dateDec 12, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S5/405
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A laser system includes a first source and a second source for generating a first laser beam and a second laser beam, respectively, and a mirror arrangement including a first interleaving laser mirror with a high reflecting area configured to reflect the first laser beam and a first high transmitting area configured to transmit the second laser beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.