Laser beam interleaving
US8345724B2 · kind B2 · utility
1Cited by
13References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2008 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Dec 12, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/405
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A laser system includes a first source and a second source for generating a first laser beam and a second laser beam, respectively, and a mirror arrangement including a first interleaving laser mirror with a high reflecting area configured to reflect the first laser beam and a first high transmitting area configured to transmit the second laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.