Patent · US Active

Polishing wheel

US8348717B2 · kind B2 · utility

2Cited by

8References

20Claims

0Family size

Assignee

Essilor International (Compagnie Generale d'Optique) · FR

Inventors

Marc Silva · Roanoke, US
James Daniel Riall · St. Augustine, US
Jean-Marc Padiou · Charenton-le-Pont, FR
Loic Quere · Charenton-le-Pont, FR

Key dates

Filing date	Dec 21, 2005
Grant date	Jan 8, 2013
Priority date	—
Expiry date	Aug 15, 2028

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B13/01
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing wheel (10) arranged to polish an article. The polishing wheel comprises a hub (12) provided with an axial cavity (18) coaxial with an axis (26). The polishing wheel further comprises a substrate layer (14) being made of an elastomer material affixed to the hub (12) and coaxial with the axis (26). The substrate layer (14) has an outer surface (20) having a substantially symmetrical shape with respect to the axis (26). The polishing wheel (10) further comprises a continuous cover layer (16) affixed to the outer surface (20) and coaxial with the axis (26). The continuous cover layer (16) is made of an elastomer material covering substantially entirely the outer surface (20).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.