Method of plasma nitriding of alloys via nitrogen charging
US8349093B2 · kind B2 · utility
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19References
9Claims
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Key dates
| Filing date | Jun 8, 2009 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | Sep 23, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12458
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A nitrided metal includes a metal core with a first microstructure and a nitrogen-containing solid solution region on the metal core. The nitrogen-containing solid solution region is free of nitride compounds and includes a second microstructure which is equivalent to the first microstructure. The first microstructure and the second microstructure are a tetragonal crystal structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.