Method and system for providing a magnetoresistive structure using undercut free mask
US8349195B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2008 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | Nov 9, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and system provide a magnetoresistive structure from a magnetoresistive stack that includes a plurality of layers. The method and system include providing a mask that exposes a portion of the magnetoresistive stack. The mask has at least one side, a top, and a base at least as wide as the top. The method and system also include removing the portion of the magnetoresistive stack to define the magnetoresistive structure. The method and system further include providing an insulating layer. A portion of the insulating layer resides on the at least one side of the mask. The method and system further include removing the portion of the insulating layer on the at least one side of the mask and removing the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.