Conductive layer including implanted metal ions
US8349527B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | May 23, 2011 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | May 23, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.