Field electron emission source
US8350459B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 25, 2008 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | Jun 27, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2203/0272
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a field electron emission source includes: providing an insulating substrate; patterning a cathode layer on at least one portion of the insulating substrate; forming a number of emitters on the cathode layer; coating a photoresist layer on the insulating substrate, the cathode layer and the emitters; exposing predetermined portions of the photoresist layer to radiation, wherein the exposed portions are corresponding to the emitters; forming a mesh structure on the photoresist layer; and removing the exposed portions of photoresist layer. The method can be easily performed and the achieved the field electron emission source has a high electron emission efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.