Model import for electronic design automation
US8352888B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2011 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | May 26, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods and systems for providing processing parameters in a secure format are disclosed. In one aspect, a method for providing semiconductor fabrication processing parameters to a design facility is disclosed. The method comprises providing a set of processing parameters of a fabrication facility; creating a model from the set of processing parameters; converting the model into a corresponding set of kernels; converting the set of kernels into a corresponding set of matrices; and communicating the set of matrices to the design facility. In another aspect, a method for providing semiconductor fabrication processing parameters is disclosed. The method comprises providing a set of processing parameters of a fabrication facility; creating a processing model from the set of processing parameters; encrypting the processing model into a format for use with a plurality of EDA tools; and communicating the encrypted processing model format to a design facility.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.