Method for producing porous microneedles and their use

US8354033B2 · kind B2 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Dick Scholten · Stuttgart, DE
• Julia Cassemeyer · Reutlingen, DE
• Michael Stumber · Ditzingen, DE
• Franz Laermer · Stuttgart, DE
• Ando Feyh · Palo Alto, US
• Christian Maeurer · Leonberg, DE

Key dates

• Filing date: Apr 27, 2007
• Grant date: Jan 15, 2013
• Expiry date: Sep 19, 2029

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C2201/0115
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

A method for producing porous microneedles (10) situated in an array on a silicon substrate includes: providing a silicon substrate, applying a first etching mask, patterning microneedles using a DRIE process (“deep reactive ion etching”), removing the first etching mask, at least partially porosifying the Si substrate, the porosification beginning on the front side of the Si substrate and a porous reservoir being formed.