Patent · US Active

Image sensor and method for manufacturing an image sensor

US8354700B2 · kind B2 · utility

0Cited by

2References

15Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Ulrich Seger · Renningen, DE
Roland Schmid · Ann Arbor, US
Uwe Apel · Neckartailfingen, DE
Gerald Franz · Backnang, DE
Andreas Reppich · Leonberg, DE

Key dates

Filing date	Nov 2, 2009
Grant date	Jan 15, 2013
Priority date	—
Expiry date	Nov 2, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH04N2209/045
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An image sensor and a method for manufacturing an image sensor are described in which the image sensor includes at least one substrate having a plurality of light-sensitive elements forming a sensor field and first microfilter elements for wavelength-selective filtering of incident light. The first microfilter elements are attached to a transparent carrier made of glass or a transparent film, for example. A first microfilter element is situated in front of a portion of the light-sensitive elements for wavelength-selective filtering of light striking the light-sensitive element. No microfilter element is situated in front of a further portion of the light-sensitive elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.