Patent · US Active

Method for assembling at least two plates and use of the method for preparing an ion beam sputtering assembly

US8357259B2 · kind B2 · utility

0Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 3, 2008
Grant dateJan 22, 2013
Priority date
Expiry dateJul 27, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/3491
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

According to the method, drops of an adhesive material are deposited on one of the plates, with the drops being spaced from one another. A grid having a predefined thickness lower than that of the drops is applied to the plate receiving the drops. A perpendicular and uniform pressure is applied to at least one of the plates, so that the drops spread and come into contact with the opposing sides of the two plates. The spacing of the drops is defined so that after spreading under the pressure applied, air is not trapped between the drops.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.