Exhaust gas after-treatment device and method of use
US8361423B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 25, 2011 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Jul 20, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of operating an exhaust gas after-treatment device with a substrate having a catalyst thereon directs exhaust gas through a first portion of the substrate during a cold-start of the after-treatment device, where the first portion of the substrate less than an entirety of the substrate. After light-off of the catalyst in the first portion of the substrate, exhaust gas is directed through the entirety of the substrate. An exhaust gas after-treatment device for carrying out the method includes a flow control device having a cold start configuration and a light off configuration, wherein the cold start configuration directs exhaust gas through the first portion of the substrate, and the light off configuration directs exhaust gas through the entirety of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.