Manufacturing method of photonic crystal
US8361545B2 · kind B2 · utility
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Key dates
| Filing date | Jun 1, 2006 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Apr 27, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.