Method of forming optical sensor

US8361818B2 · kind B2 · utility

Assignee

• Au Optronics Corporation · TW

Inventors

• An-Thung Cho · Wanrong, TW
• Chia-Tien Peng · Hsinchu, TW
• Kun-Chih Lin · Hsinchu, TW

Key dates

• Filing date: Sep 1, 2010
• Grant date: Jan 29, 2013
• Expiry date: Apr 9, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E10/50

Abstract

A method of forming an optical sensor includes the following steps. A substrate is provided, and a read-out device is formed on the substrate. a first electrode electrically connected to the read-out device is formed on the substrate. a photosensitive silicon-rich dielectric layer is formed on the first electrode, wherein the photosensitive silicon-rich dielectric layer comprises a plurality of nanocrystalline silicon crystals. A second electrode is formed on the photosensitive silicon-rich dielectric layer.