Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same
US8367005B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2008 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Apr 21, 2029 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF01N2240/28
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.