Method for purifying silicon for photovoltaic applications
US8367008B2 · kind B2 · utility
0Cited by
7References
17Claims
0Family size
Inventors
Key dates
| Filing date | Mar 5, 2009 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Oct 30, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/037
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The disclosure relates to a method for purifying silicon by exposing liquid silicon to a plasma, wherein the silicon flows continuously into a channel so that the free surface thereof is exposed to the plasma. The disclosure also relates to a device for implementing the method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.