Patent · US Active

Annealable layer system

US8367226B2 · kind B2 · utility

1Cited by

8References

6Claims

0Family size

Assignee

VON ARDENNE Anlagentechnik GmbH · DE

Inventors

Joerg Fiukowski · Torgau, DE
Matthias List · Dresden, DE
Hans Hecht · Stuttgart, DE
Falk Milde · Dresden, DE

Key dates

Filing date	Jul 23, 2010
Grant date	Feb 5, 2013
Priority date	—
Expiry date	Jul 23, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31663
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.