Rapid patterning of nanostructures
US8367525B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2010 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Aug 20, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/962
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.