Susceptor device, manufacturing apparatus of epitaxial wafer, and manufacturing method of epitaxial wafer
US8372196B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2009 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Nov 25, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a manufacturing apparatus for manufacturing an epitaxial wafer with a wafer being mounted substantially concentrically with a susceptor, a center rod is provided to extend in an up-and-down direction on a side of a non-mounting surface of the susceptor so that its upper end is adjacent to the center of the susceptor. With this arrangement, part of radiation light irradiated toward the susceptor is diffusely reflected by the center rod before reaching the central portion of the susceptor, thereby reducing the amount of the radiation light irradiated to the central portion of the susceptor as well as lowering the temperature of the portion. Since the center rod and the susceptor are not in surface contact, the center rod does not take the heat from the susceptor, thereby suppressing the temperature from decreasing locally at the central portion of the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.