Use of a shadow mask and a soft mask for aligned implants in solar cells
US8372737B1 · kind B1 · utility
3Cited by
0References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2011 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Jun 28, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An improved method of implanting a solar cell is disclosed. A substrate is coated with a soft mask material. A shadow mask is used to perform a pattern ion implant and to set the soft mask material. After the soft mask material is set, the mask is removed and a blanket implant is performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.