Systems and methods for profiling an application running on a parallel-processing computer system
US8375368B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2007 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Aug 18, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2201/865
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A runtime system implemented in accordance with the present invention provides an application platform for parallel-processing computer systems. Such a runtime system enables users to leverage the computational power of the parallel-processing computer systems to accelerate/optimize numeric and array-intensive computations in their application programs. A profiling tool is used to collect, analyze, and visualize the performance data of an application in connection with its execution on a parallel-processing computer system through the runtime system. This profiling tool greatly enhances an application developer's ability to understand how an application is executed on the parallel-processing computer system and fine-tune the application to achieve high performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.