Patent · US Active

Method for manufacturing porous microstructures, porous microstructures manufactured according to this method, and the use thereof

US8377315B2 · kind B2 · utility

0Cited by
4References
17Claims
0Family size

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Key dates

Filing dateNov 19, 2008
Grant dateFeb 19, 2013
Priority date
Expiry dateOct 13, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/249978
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

A method for manufacturing porous microstructures in a silicon semiconductor substrate, porous microstructures manufactured according to this method, and the use thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.