Patent · US Active

Etchant for metal wiring and method for manufacturing metal wiring using the same

US8377325B2 · kind B2 · utility

2Cited by
0References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 22, 2011
Grant dateFeb 19, 2013
Priority date
Expiry dateSep 7, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/441
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.