Patent · US Active

Fixed mask design improvements

US8378318B1 · kind B1 · utility

4Cited by

5References

20Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

George M. Gammel · Marblehead, US
Benjamin B. Riordon · Newburyport, US

Key dates

Filing date	Nov 18, 2011
Grant date	Feb 19, 2013
Priority date	—
Expiry date	Nov 18, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P70/50
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A mask or set of masks is disclosed in which outward projections are placed on either side of at least one aperture. An ion beam is then directed through the mask toward a workpiece. An ion collecting device or an optical system is then used to measure the alignment of the mask to the ion beam. These projections serve to increase the sensitivity of the system to misalignment. In another embodiment, a blocker is used to create a region of the workpiece that is not subjected to a blanket implant. This facilitates the use of optical means to insure and determine alignment of the mask to the ion beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.