Spinous process implants, instruments, and methods
US8382801B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2009 |
| Grant date | Feb 26, 2013 |
| Priority date | — |
| Expiry date | Feb 14, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B17/82
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Spinous process implants and associated methods are shown and described. In one aspect, the implant limits the maximum spacing between the spinous processes. In another aspect, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect, instrumentation for inserting the implant is provided. In other aspects, methods for treating spine disease are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.