Patent · US Active

System and method for depositing a material on a substrate

US8382901B2 · kind B2 · utility

0Cited by

18References

23Claims

0Family size

Assignee

First Solar, Inc. · US

Inventors

Ricky C. Powell · Ann Arbor, US
Andrew Kelly Gray · Perrysburg, US
Todd Alden Coleman · Wooster, US

Key dates

Filing date	Jun 3, 2011
Grant date	Feb 26, 2013
Priority date	—
Expiry date	Jun 3, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T137/0318
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.