Pattern exposure method and pattern exposure apparatus
US8383330B2 · kind B2 · utility
1Cited by
1References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2006 |
| Grant date | Feb 26, 2013 |
| Priority date | — |
| Expiry date | May 25, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an exposure period T synchronized with the work conveying speed V. The photomask (29) is disposed at a proximity gap from the belt-like work (11). Mask patterns (33) on the photomask (29) are exposed on the belt-like work (11) to form periodic patterns thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.