Deposition of photovoltaic thin films by plasma spray deposition
US8383451B2 · kind B2 · utility
1Cited by
1References
14Claims
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Key dates
| Filing date | Mar 2, 2010 |
| Grant date | Feb 26, 2013 |
| Priority date | — |
| Expiry date | Jul 22, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In particular embodiments, a method is described for depositing thin films, such as those used in forming a photovoltaic cell or device. In a particular embodiment, the method includes providing a substrate suitable for use in a photovoltaic device and plasma spraying one or more layers over the substrate, the grain size of the grains in each of the one or more layers being at least approximately two times greater than the thickness of the respective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.