Optical pattern projection
US8384997B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2010 |
| Grant date | Feb 26, 2013 |
| Priority date | — |
| Expiry date | May 2, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/1086
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Optical apparatus includes first and second diffractive optical elements (DOEs) arranged in series to diffract an input beam of radiation. The first DOE is configured to apply to the input beam a pattern with a specified divergence angle, while the second DOE is configured to split the input beam into a matrix of output beams with a specified fan-out angle. The divergence and fan-out angles are chosen so as to project the radiation onto a region in space in multiple adjacent instances of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.