Patent · US Active

Method for designing overlay targets and method and system for measuring overlay error using the same

US8386969B2 · kind B2 · utility

3Cited by

0References

17Claims

0Family size

Assignee

Industrial Technology Research Institute · TW

Inventors

Wei-Te Hsu · New Taipei, TW
Yi-Sha Ku · Hsinchu, TW

Key dates

Filing date	Sep 6, 2011
Grant date	Feb 26, 2013
Priority date	—
Expiry date	Sep 11, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70633
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for designing an overlay target comprises selecting a plurality of overlay target pairs having different overlay errors or offsets, calculating a deviation of the simulated diffraction spectrum for each overlay target pair, selecting a plurality of sensitive overlay target pairs by taking the deviation of the simulated diffraction spectrum into consideration, selecting an objective overlay target pair from the sensitive overlay target pairs by taking the influence of the structural parameters to the simulated diffraction spectrum into consideration, and designing the overlay target pair based on the structural parameter of the objective overlay target pair.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.