Method and apparatus for cathodic arc ion plasma deposition
US8387561B2 · kind B2 · utility
5Cited by
21References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2010 |
| Grant date | Mar 5, 2013 |
| Priority date | — |
| Expiry date | Dec 18, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32614
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for depositing a coating material on a surface of a substrate by an ion plasma deposition process using a hollow cathode is disclosed. The cathode may be a substantially cylindrical hollow cathode. A plasma arc is formed on the outer circumference of the cathode to remove coating material from the cathode, which is then deposited on a surface of a substrate. An internal arc drive magnet is contained within the hollow bore of the cathode and cooling is provided to the magnet during operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.