Patent · US Active

System and method for depositing a material on a substrate

US8388754B2 · kind B2 · utility

4Cited by

18References

16Claims

0Family size

Assignee

First Solar, Inc. · US

Inventors

Ricky C. Powell · Ann Arbor, US
Andrew Kelly Gray · Perrysburg, US
Todd Alden Coleman · Wooster, US

Key dates

Filing date	Feb 15, 2011
Grant date	Mar 5, 2013
Priority date	—
Expiry date	Feb 15, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/0262
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.