Fabrication technique for metallic devices with embedded optical elements, optical devices, or optical and electrical feedthroughs
US8389054B2 · kind B2 · utility
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28Claims
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Key dates
| Filing date | Aug 14, 2008 |
| Grant date | Mar 5, 2013 |
| Priority date | — |
| Expiry date | Jun 3, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and related systems for fabricating a device or a part, the method including the step of growing at least one material from a vapor phase, by a CVD process, for example a MO-CVD process, on a heated base substrate, wherein the at least one material conforms to one of at least one topographical pattern of the base substrate, one or more predefined geometrical shape on the base substrate or both. The method includes removing the base substrate embedded in the CVD deposited material, as well as optionally machining a portion of the CVD deposited material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.