Patent · US Active

Patterning nano-scale patterns on a film comprising unzipping polymer chains

US8389205B2 · kind B2 · utility

31Cited by
2References
17Claims
0Family size

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Inventors

Key dates

Filing dateJun 11, 2009
Grant dateMar 5, 2013
Priority date
Expiry dateApr 27, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2049
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.