Patent · US Active

Metal trace fabrication for optical element

US8389851B2 · kind B2 · utility

1Cited by
78References
14Claims
0Family size

Assignees

Inventors

Key dates

Filing dateOct 21, 2010
Grant dateMar 5, 2013
Priority date
Expiry dateJun 4, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/10
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A system may include an optical element including a surface defining a recess, conductive material disposed within the recess, and a solder mask disposed over a portion of the conductive material. The solder mask may define an aperture through which light from the optical element may pass. Some aspects provide creation of an optical element including a surface defining a recess, deposition of conductive material on the surface such that a portion of the deposited conductive material is disposed within the recess, and substantial planarization of the surface to expose the portion of the conductive material disposed within the recess.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.