Method for forming diamond-like carbon film
US8394455B2 · kind B2 · utility
1Cited by
4References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 17, 2008 |
| Grant date | Mar 12, 2013 |
| Priority date | — |
| Expiry date | Apr 19, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2327/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is a method for forming a diamond-like carbon (DLC) film capable of enhancing the adhesion strength of a diamond-like carbon (DLC) film by simple steps. A surface of a substrate 11 made of polytetrafluoroethylene (PTFE) is modified by plasma radiation, and a diamond-like carbon film 12 is formed on the modified PTFE substrate 11 surface by chemical vapor deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.