Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles
US8394658B2 · kind B2 · utility
0Cited by
13References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2011 |
| Grant date | Mar 12, 2013 |
| Priority date | — |
| Expiry date | Sep 21, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed are methods of forming multi-doped junctions, which utilize a nanoparticle ink to form an ink pattern on a surface of a substrate. From the ink pattern, a densified film ink pattern can be formed. The disclosed methods may allow in situ controlling of dopant diffusion profiles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.