Optical element manufacturing method, optical element exposure device, optical element, lighting optical device, display device, and electronic apparatus
US8395726B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2010 |
| Grant date | Mar 12, 2013 |
| Priority date | — |
| Expiry date | Jun 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133524
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an optical element manufacturing method that is capable of forming various kinds of shapes and capable of achieving sophisticated functions, improved yields, and cost reductions. The method includes: a step that applies a transparent photosensitive resin on a transparent substrate with light-shielding patterns provided thereon; a step that forms transparent layers by performing patterning through irradiating exposure light of an arbitrary amount on the transparent photosensitive resin via the transparent substrate with the light-shielding patterns provided thereon; a step that forms light absorption layers by filling a black curable resin between the transparent layers; and an irradiation step that irradiates the exposure light in an oblique direction to the surface of the transparent substrate where the light-shielding patterns are formed in a state where the transparent substrate is being bent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.