Patent · US Active

Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters

US8397667B2 · kind B2 · utility

37Cited by
9References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 2005
Grant dateMar 19, 2013
Priority date
Expiry dateOct 23, 2028

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/52
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The invention provides a process for coating workpieces by plasma-induced chemical vapor deposition, in which a process gas is introduced into a coating chamber and a plasma is ignited by electromagnetic energy in at least one region of the coating chamber which adjoins the workpiece and in which the process gas is present, wherein the coating operation is monitored on the basis of at least one measured spectral parameter of the plasma, and the workpiece is removed in the event of a deviation from a desired range for the parameter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.