Method and apparatus for fabricating a precision optical surface
US8398251B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 4, 2009 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | May 13, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24355
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method involves forming a first surface on a substrate, applying to the first surface a layer of a material having a thickness less than approximately 10 microns, and precision polishing the layer of material to form a precision optical second surface on a side of the layer opposite from the substrate. A different aspect involves an apparatus that includes a substrate having a first surface, and a layer provided on the surface and having a thickness less than approximately 10 microns, the layer having on a side thereof opposite from the substrate a polished second surface with an RMS surface roughness less than approximately 10 Angstroms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.