Load chamber with heater for a disk sputtering system
US8399809B1 · kind B1 · utility
75Cited by
8References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 5, 2010 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Dec 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/851
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.