Registration of an extended reference for parameter measurement in an optical sensing system
US8400620B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2011 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Sep 21, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L1/242
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An interferometric measurement system measures a parameter using at least one optical waveguide. A memory stores reference interferometric pattern data associated with a segment of the optical waveguide. Interferometric detection circuitry detects and stores measurement interferometric pattern data associated with the segment of the optical waveguide during a measurement operation. A spectral range of the reference interferometric pattern of the optical waveguide is greater than a spectral range of the measurement interferometric pattern of the optical waveguide. A processor shifts one or both of the measurement interferometric pattern data and the reference interferometric pattern data relative to the other to obtain a match and to use the match to measure the parameter. An example parameter is strain.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.