Dynamic metrology methods and systems
US8401691B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2009 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Feb 12, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/37388
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The present invention provides dynamic metrology methods and systems for: periodically determining an actual position of one or more of a machine and a tool with respect to a workpiece using one or more laser interferometers; tracking a tracked position of the one or more of the machine and the tool with respect to the workpiece using one or more accelerometers; and altering a controlled position of the one or more of the machine and the tool with respect to the workpiece when either the actual position or the tracked position of the one or more of the machine and the tool with respect to the workpiece diverges from a desired position of one or more of the machine and the tool with respect to the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.